硅襯底BDD電極 Substrate

BDD Electrode
on Silicon

Boron-doped polycrystalline diamond film grown directly on silicon substrates. 標準BDD電化學電極平臺,適用於水處理、化學傳感和半導體加工。

硅襯底BDD電極

硅襯底BDD電極 — boron-doped polycrystalline diamond film on Si substrate

The Industry-Standard BDD Electrode

Silicon is the dominant substrate for BDD electrodes — leveraging standard semiconductor fab tooling, established supply chains, and cost-effective wafer formats.

Conducting Diamond on Si

Boron-doped diamond film (typically heavy-doped) grown directly on silicon. Combines diamond's chemical inertness with Si's standard fab compatibility.

Wide Electrochemical Window

Diamond's 5.5 eV bandgap enables a much wider electrochemical window than metal electrodes. Drives oxidation reactions that conventional materials cannot.

Extreme Chemical Durability

Diamond film is inert to acids, bases, and aggressive solvents. Operates continuously in conditions that destroy metal electrodes in days.

Applications

Where BDD-on-Si Ships

Water Treatment

Industrial wastewater oxidation

BDD-on-Si electrodes for industrial water treatment — oxidizing persistent organic pollutants (POPs), pharmaceuticals, and PFAS that resist conventional treatment.

Electrochemical Sensing

Trace analyte detection

BDD-on-Si for biomedical and environmental sensors. The wide window enables detection of analytes invisible to metal electrodes.

Semiconductor Processing

Wafer-level electrochemical

BDD-on-Si for semiconductor process equipment — wafer-level electrochemical etching, polishing, and surface modification.

Wafer specifications are partner-level

登錄 to see the standard Si wafer sizes, BDD film thicknesses, doping tiers, and back-contact metallization options.

Contact us Sign up for newsletter

Tell us your electrochemistry

Tell us your target Si wafer size, BDD film spec, and quantity — we'll respond with a Custom DFM plan and a quote within 48 hours.